components and process md docs

docs/components/ebeam/Waveguides/waveguides.md

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+# Waveguides
+
+## Description
+
+Waveguides are components that guide waves. Although these are individual components that can be adjusted
+for use, it is recommended to draw paths in KLayout and convert them to waveguides using the built-in SiEPIC
+features.
+Waveguide_bump is specifically used to make a slightly longer waveguide within the same amount of space, e.g.,
+20 μm, plus 50 nm.
+
+## Model Name
+- Waveguide
+- Waveguide_bump
+- Waveguide_bend
+- Waveguide_sbend
+- Waveguide_straight
+
+![alt text](imgs/gds.png)
+*Fig. 1: Layout of waveguides*
+
+## Compact Model Information
+
+- Support for TE and TM polarization
+- Operating around 1550 nm and 1310 nmwavelength
+
+![alt text](imgs/sem.png)
+
+*Fig. 2: SEM Picture of Bragg Gratings*
+
+
+## Experimental Results
+
+![alt text](imgs/exp_loss.png)
+
+*Fig. 3: Measured Loss*
+
+![alt text](imgs/exp_ng.png)
+
+*Fig. 4: Measured waveguide group index*
+
+## Additional Details
+
+- **Design tools & methodology:**
+  - Support for Monte Carlo using wafer map
+  - Model uses interpolation for geometries not in the database
+  - In “Electron beam lithography writing strategies for low loss high confinement silicon optical waveguides,”
+    - 400 nm waveguide width was used. A variety of write methods were explored which had trade-offs of
+    - write-time vs. loss.
+    - SiEPIC runs use 4th Lens, 2-pass field shift writing, with default 6 nm shot pitch, 8 nA beam current.
+    - Design tools & methodology: Cut-back method for determining loss from “Electron beam lithography
+    writing strategies for low loss high confinement silicon optical waveguides”
+
+- **Reference:**
+  - R. J. Bojko, J. Li, L. He, T. Baehr-Jones, M. Hochberg, Y. Aida, "Electron beam lithography writing strategies
+for low loss high confinement silicon optical waveguides", J. Vac. Sci. Technol. B, vol. 29, no. 6, Oct. 2011.

docs/components/ebeam/bezier_bend/bezier_bend.md

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+# bezier_bend
+
+## Component Name
+
+- Bezier_Bend (EBeam_Beta)
+
+## Description
+Waveguide bend PCell using Bezier curve.
+
+
+## Model Name
+
+
+**[Model Name]**
+
+![alt text](imgs/gds.png)
+
+*Fig. 1: Layout of Bezier_Bend*
+
+## Compact Model Information
+
+- No compact model available.
+
+## Parameters
+
+| Parameter      | Default Value | Notes       |
+|----------------|---------------|-------------|
+| Bezier factor  | 25            | [Note_1]    |
+| Effective bend radius  | 5.0um     | [Note_2]    |
+| Waveguide width  | 500nm     | [Note_3]    |
+| Layers  | 1     | [Note_4]    |
+
+## Experimental Results
+![alt text](imgs/exp.png)
+*Fig. 2: Experimental Results*
+
+## Additional Details
+
+- **Design tools & methodology:**
+  - 3D-FDTD (Lumerical FDTD Solutions)
+  - Eigenmode expansion propagator (MODE Solutions)
+
+
+- **Reference:**
+  - Han Yun, et al., "2×2 Adiabatic 3-dB Coupler on Silicon-on-Insulator Rib Waveguides",
+Proc. SPIE, Photonics North 2013, vol. 8915, pp. 89150V, 06/2013 [(pdf)](refs/2x2%20Adiabatic%203dB%20Coupler%20in%20Silicon-on-Insulator%20Rib%20Waveguide.pdf)
+

docs/components/ebeam/contra_directional_coupler/contra_directional_coupler.md

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+# Contra-directional couplers
+
+## Component Name
+
+- contra_directional_coupler
+
+Other custom designs (EBeam_Beta):
+- Contra_DC_Bent
+- Contra_DC_CoupelrApodized
+- Contra_DC_SWG
+- Contra_DC_SWG_Chirped
+- Contra_DC_Custom
+- Contra_DC_DualBragg
+
+
+
+## Description
+
+Waveguide contra-directional couplers (CDCs) with high coupling efficiency and low back reflections for both transverse electric (TE) and transverse magnetic (TM) modes. This device can be used as an optical add-drop filter.
+
+## Model Name
+
+![alt text](imgs/gds.png)
+
+*Fig. 1: Layout of contra_directional_coupler*
+
+## Compact Model Information
+
+- Support for TE polarization
+- Operating at 1550 nm wavelength
+- Performance:
+  - TE – 6 nm 3-dB bandwidth, 0.05 dB insertion loss
+
+
+![alt text](imgs/sem.png)
+
+*Fig. 2: SEM Picture of contra-directional couplers*
+
+## Parameters
+
+| Parameter      | Default Value | Notes       |
+|----------------|---------------|-------------|
+| Number of Grating Periods  | 300     | [Note_1]    |
+| Grating Period (microns)  | 0.317     | in microns     |
+| Waveguide 1 Corrugation Width (microns)  | 0.05     | in microns     |
+| Waveguide 2 Corrugation Width (microns)  | 0.03     | in microns     |
+| Grating Type  | False     | False = Rectangular, True = Sinusoidal     |
+| Waveguide1  Width (microns)  | 0.56     | in microns     |
+| Waveguide2 Width (microns)  | 0.44     | in microns     |
+| S-bend Length (microns)  | 10     | in microns     |
+| S-bend radius (microns)  | 15     | in microns     |
+| Gaussian apodization index  | 10     |     |
+| Gap (microns)  | 0.1     | in microns     |
+| Anti-reflection  | False     | True/False     |
+
+## Experimental Results
+
+![alt text](imgs/exp_wavl.png)
+
+*Fig. 3: (a) Measured and calibrated drop port spectra of various contra-
+DCs of various stages, fabricated from October 2021 to February 2024.
+(b) The same measurements off-setted to a common center wavelength
+to highlight the effects of variability on the devices’ spectra.*
+
+![alt text](imgs/exp_loss.png)
+
+*Fig. 4: Statistically extracted measurements of the same contra-DC de-
+vice measured across various fabrication runs on the same fabrication
+process highlighting: (a) the effects of process variability on process
+corners and (b) the effects of process variability on the device’s inser-
+tion loss.
+
+![alt text](imgs/exp_temp.png)
+
+*Fig. 5: Measurements of a contra-DC device vs. temperature. The plot
+shows the calibrated transmission spectra of the device at various tem-
+peratures ranging from 15°C to 75°C. As temperature increases, the
+transmission peak shifts, demonstrating the temperature-dependent be-
+havior of the device. The gradient color scheme represents different
+temperatures, with blue indicating lower temperatures and red indicat-
+ing higher temperatures.*
+
+## Additional Details
+
+- **Design tools & methodology:**
+  - Hand-drawn layout (kLayout)
+  - Post-fabrication modeling using band-structure calculation in 3D-FDTD
+  - (Lumerical FDTD Solutions)
+  - [Simulation and layout tutorials](https://github.com/SiEPIC/SiEPIC_Bragg_workshop/tree/main/contra_directional_couplers)

docs/components/ebeam/directional_coupler/directional_coupler.md

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+# ebeam_dc
+
+## Component Name
+
+- ebeam_dc_te1550
+- ebeam_dc (EBeam_Beta)
+
+## Description
+The directional coupler is commonly used for splitting and combining light in photonics. It consists of two parallel
+waveguides where the coupling coefficient is influenced by the waveguide length and the distance between
+waveguides.
+
+![alt text](imgs/sem.png)
+
+## Model Name
+
+![alt text](imgs/gds.png)
+
+*Fig. 1: Layout of Directional Coupler*
+
+## Compact Model Information
+
+
+![alt text](imgs/cml.png)
+
+## Parameters
+
+| Parameter      | Default Value | Notes       |
+|----------------|---------------|-------------|
+| Coupling Length  | 10     | in microns     |
+| Radius  | 10.0     | in microns     |
+| Waveguide width  | 0.5     | in microns     |
+| Gap  | 0.2     | in microns     |
+| Layers  | 1     |     |
+
+## Experimental Results
+
+![alt text](imgs/exp_te1550.png)
+*Fig. 2: Experimental Results for TE 1550 nm*
+
+## Additional Details
+
+- **Design tools & methodology:**
+  - 3D-FDTD (Lumerical FDTD Solutions)
+  - Eigenmode expansion propagator (MODE Solutions)
+
+
+- **Reference:**
+  -